7 Asa Drive
Lehigh University, Bethlehem, PA 18015
USA
High Sensitivity — Low Energy Ion Scattering (HS-LEI S)
[Ion-TOF Qtac 100]
The world’s most sensitive spectrometer for identifying surface atoms (topmost layer ~0.3nm), offering a 3,000-fold improvement in sensitivity over conventional spectrometers allowing for elemental 2-D surface mapping and depth profiling.
High Resolution — X-ray Photoelectron Spectroscopy (HR-XPS)
[Scienta ESCA 300]
One of the world’s most powerful XPS systems allowing for chemical analysis of the top 10–20 atomic layers (~1–3nm).
These two surface analytical techniques complement each other well and the combination of these two techniques allow for a very comprehensive understanding of a material’s surface composition and chemical state, which is of particular interest for catalysts, fuel cells, semiconductors, LEDs, ceramics, etc.
Atomic Force Microscopy (AFM)
[NT-MD T Solver NE XT]
In addition to standard surface topology, the electrical and magnetic properties can also be detailed with respect to a material’s surface.
Special Introductory Offer
One sample will be accepted per company for a free exploratory analysis on the instrument of your choice and the data will be available for discussion during the symposium on June 20, 2013. Contact Dr. Robert Pafchek at pafchek@lehigh.edu to submit your sample in advance of the symposium.