Symposium on Advanced Surface Analysis: Unique Surface Characterization Tools

When:
June 20, 2013 all-day
2013–06-20T00:00:00–04:00
2013–06-21T00:00:00–04:00
Where:
Sin­clair Lab Audi­to­ri­um
7 Asa Dri­ve
Lehigh Uni­ver­si­ty, Beth­le­hem, PA 18015
USA
Con­tact:
Dr. Robert Pafchek

High Sensitivity — Low Energy Ion Scattering (HS-LEI S)

[Ion-TOF Qtac 100]

 
The world’s most sen­si­tive spec­trom­e­ter for iden­ti­fy­ing sur­face atoms (top­most lay­er ~0.3nm), offer­ing a 3,000-fold improve­ment in sen­si­tiv­i­ty over con­ven­tion­al spec­trom­e­ters allow­ing for ele­men­tal 2-D sur­face map­ping and depth pro­fil­ing.

High Resolution — X-ray Photoelectron Spectroscopy (HR-XPS)

[Scienta ESCA 300]

 
One of the world’s most pow­er­ful XPS sys­tems allow­ing for chem­i­cal analy­sis of the top 10–20 atom­ic lay­ers (~1–3nm).

These two sur­face ana­lyt­i­cal tech­niques com­ple­ment each oth­er well and the com­bi­na­tion of these two tech­niques allow for a very com­pre­hen­sive under­stand­ing of a material’s sur­face com­po­si­tion and chem­i­cal state, which is of par­tic­u­lar inter­est for cat­a­lysts, fuel cells, semi­con­duc­tors, LEDs, ceram­ics, etc.

Atomic Force Microscopy (AFM)

[NT-MD T Solver NE XT]

 
In addi­tion to stan­dard sur­face topol­o­gy, the elec­tri­cal and mag­net­ic prop­er­ties can also be detailed with respect to a material’s sur­face.

Special Introductory Offer

 
One sam­ple will be accept­ed per com­pa­ny for a free explorato­ry analy­sis on the instru­ment of your choice and the data will be avail­able for dis­cus­sion dur­ing the sym­po­sium on June 20, 2013. Con­tact Dr. Robert Pafchek at pafchek@​lehigh.​edu to sub­mit your sam­ple in advance of the sym­po­sium.